Extreme Ultraviolet (EUV) Lithography Market Size, Share and Trends

Report Code SE 6398
Published in Dec, 2024, By MarketsandMarkets™
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Extreme Ultraviolet (EUV) Lithography Market by Component (Light Sources, Optics, Masks, EUV Metrology, EUV Sensors, EUV Subassembly) and End User (Integrated Device Manufacturers (IDMs), Foundries) - Global Forecast to 2029

 

Extreme Ultraviolet (EUV) Lithography Market Size, Share & Trends

The Extreme Ultraviolet (EUV) Lithography Market is expected to grow from USD 12.18 billion in 2024 to USD 22.69 billion by 2029, at a CAGR of 13.2% from 2024 to 2029. The market is growing on the back of increasing investment in data center infrastructure globally. High-performance processors and memory and power management chips are required for handling big data analytics, storage needs, and emerging AI workloads, such as Generative AI and Machine Learning. Companies such as Amazon and Google are rapidly increasing investments in their data centers to support their cloud services and AI services.

Extreme Ultraviolet (EUV) Lithography Market

Attractive Opportunities in the Extreme Ultraviolet (EUV) Lithography Market

ASIA PACIFIC

Asia Pacific leads the EUV lithography market due to its dominance in semiconductor manufacturing, driven by the presence of key players like TSMC and SAMSUNG. Strong demand, heavy investments, and government support solidify its position as the hub for advanced chip production.

Growing need in consumer electronics, automotive, AI, and 5G applications are driving the EUV Lithography market.

The EUV lithography market is projected to reach USD 22.69 billion by 2029 at a CAGR of 13.2% during the forecast period.

Governments in Asia Pacific, particularly in countries like South Korea, Taiwan, and China, are providing substantial financial incentives, tax benefits, and subsidies to boost domestic semiconductor manufacturing. These initiatives aim to enhance self-reliance, attract investments in EUV technology, and maintain global competitiveness in the semiconductor industry

Development of state-of-the-art fabrication facilities in Taiwan, South Korea, and China are supporting the market growth.

Impact of AI in Extreme Ultraviolet (EUV) Lithography Market

The integration of Gen AI with EUV lithography influences the precision, efficiency, and innovation in the semiconductor manufacturing process. Artificial intelligence provides advanced modeling and simulations to improve process workflows by predicting outcomes and identifying inefficiencies. This approach improves resource management and reduces the time taken for design and production. Gen Al also supports precise sub-nanometer patterning, meeting the demands of producing compact and complex semiconductor designs for advanced technological applications.

Gen Al improves defect detection and process control in quality assurance through analysis of imaging data to detect anomalies and optimize yield. It also helps in maintaining EUV lithography equipment by predicting potential failures, thus minimizing disruptions in manufacturing processes. Gen Al also enables the exploration of new chip designs, thereby helping to rapidly develop semiconductor technologies.

Extreme Ultraviolet (EUV) Lithography Market

Global Extreme Ultraviolet (EUV) Lithography Market Dynamics

DRIVER: Global expansion of semiconductor fabs

The global expansion of semiconductor fabrication facilities (fabs) is significantly fueling the growth of extreme ultraviolet lithography due to the rising demand for advanced manufacturing technologies to produce efficient, smaller, and faster chips. Extreme ultraviolet lithography has emerged as an important process for manufacturing next-generation chips. Government and semiconductor companies are investing significantly in fabs to address the vulnerabilities in the supply chain and to meet the requirements of advanced technologies like 5G, AI, and IoT. This technology operates at sub-7nm nodes with great precision, meeting the stringent requirements of advanced devices.

Countries such as the US, South Korea, Taiwan, and China are spearheading semiconductor fabs expansion with investments in new fabs. The industry is also supported by a variety of subsidies and incentives to develop domestic semiconductor production capabilities in these countries. Multiple fabs are investing in extreme ultraviolet lithography to improve yields or reduce complexity in multi-patterned processes.

This trend leads to the expansion of semiconductor fabs to meet the rising demand for advanced chips with EUV lithography technology to form a cycle of demand for high-precision lithography equipment.

RESTRAINTS: Requirement for advanced infrastructure and skilled workforce

Significant fab overhauls are required for the adoption of EUV lithography. EUV lithography systems require new cleanrooms that can provide precise environmental controls. Overhauling existing fabs or greenfield development requires extensive time and significant resources and might disturb existing fab operations. Due to the short wavelength of EUV light, it is very sensitive to reflections, scattering, and absorption by materials. Hence, improved environmental conditions, such as thermal stability and extreme cleanliness, are required.

Building and maintaining such special infrastructure increases the complexities and cost of adopting EUV lithography. The process also requires a vacuum environment, as the absorption of EUV light by air molecules can impact the operation. This adds additional challenges in installing and maintaining a vacuum system throughout the different stages of the lithography process, including the stages at the light source, scanner, and reticle. Achieving proper infrastructure and maintaining the required environmental conditions is critical for the implementation of EUV technology.

For EUV lithography to work efficiently, fabs need advanced cleanroom technologies and processes that minimize particle contamination to defect-causing levels. Increased cleanliness requirements entail significant expenses when operating a semiconductor manufacturing line.

 

OPPORTUNITY: Commercialization of advanced displays for enhanced visual experiences

The integration of extreme ultraviolet lithography into advanced display manufacturing is a major opportunity for market players. Displays such as televisions, smartphones, and tablets are evolving to meet the customer's demand for higher resolution, large size, and high-quality images.

High-resolution imaging and precise patterning are essential for manufacturing displays. EUV lithography's short wavelength addresses challenges faced by traditional optical lithography techniques to provide better resolution and the possibility of producing smaller, denser pixels, and more detailed display

It helps in developing advanced form factors and display functionalities, including curved, flexible, and foldable displays with fine pixel structures and high densities. These functionalities open up new avenues for product design and user experience and drive innovation in the display industry.

EUV lithography is poised to play a critical role in the continuing evolution of display technologies such as OLED and emerging micro LED displays due to the ability to make displays of smaller pixel sizes with higher density and improved image quality. It is a key enabler of the commercialization of advanced displays that match the fast-evolving requirements of the consumer electronics market.

CHALLENGE: High source power and productivity challenges

The EUV lithography market faces challenges in achieving and maintaining high source power and productivity levels crucial for semiconductor manufacturing. Source power is the intensity of the EUV light produced by the lithography system's light source. The speed and efficiency of wafer processing depend directly on the source power. Productivity refers to the ability of the system to process wafers effectively. It is one of the important factors necessary for high-volume production. Faster exposure times and higher throughput are crucial in high-volume semiconductor production. With increased source power, the process is more efficient, reduces time per wafer, and boosts productivity by increasing the number of wafers exposed per period. On the other hand, this poses a great technical challenge in generating stable EUV light.

The escalating demand for more advanced semiconductor chips drives the need for higher productivity. Overcoming these power and productivity challenges is important to achieve faster production cycles, reduced time-to-market, and greater manufacturing efficiencies. Significant research and development in extreme ultraviolet light source technologies is required. Innovations focused on increasing source power output and ensuring long-term operational stability are critical to meet the productivity needs of the semiconductor industry and mitigate technical limitations inherent in extreme ultraviolet lithography.

Extreme Ultraviolet (EUV) Lithography Market Ecosystem

ASML (Netherlands), KLA Corporation (US), Carl Zeiss AG (Germany), TRUMPF (Germany), TOPPAN Inc. (Japan), and AGC Inc. (Japan) are the key players in the extreme ultraviolet lithography market. ASML is the only company that manufactures EUV lithography systems, whereas multiple companies offer EUV lithography components. The top five component providers accounted for about 65-75% share of the extreme ultraviolet lithography market in 2023. The extreme ultraviolet lithography market ecosystem includes system manufacturers, component manufacturers, IDMs (integrated device manufacturers), and foundries.

Top Companies in Extreme Ultraviolet (EUV) Lithography Market
 

Optics segment to account for 2nd largest share of extreme ultraviolet (EUV) lithography market during forecast period

EUV optics are precisely built to handle extreme ultraviolet light with a wavelength of ~13.5 nanometers. They have an important role in attaining the high accuracy and precision necessary for semiconductor manufacturing. The purpose of the optics is to focus, shape, and direct the EUV light onto the silicon wafers so that precise patterns get replicated accurately. EUV optics is known as the projection lens system. It is a series of reflective mirrors guiding and focusing the EUV light down to the mask that contains the desired pattern. The pattern projected onto the silicon wafer in the image plane follows with the precision transferred to it from the mask within the object plane.

EUV optics use reflective multilayer mirrors to maximize the reflection of light and minimize loss of energy. It assists in efficient and accurate patterning. Companies such as Carl Zeiss AG, Rigaku Holdings Corporation, and Edmund Optics Inc. are leading providers of EUV optics. In December 2022, Carl Zeiss AG presented a highly advanced optical system specifically tailored for EUV lithography. The system works under vacuum conditions and only on mirrors. The system is 1.5 meters tall, weighs 3.5 tons, and includes more than 35,000 parts.

Integrated device manufacturers segment to account for the 2nd largest share of extreme ultraviolet (EUV) lithography market during forecast period

Integrated device manufacturers are important players in the semiconductor industry as they design, manufacture, and market in-house integrated circuits or chips. IDMs use this advanced technology during the development, design, and fabrication of microchips. These manufacturers invest significantly in research and development to improve EUV lithography processes and enhance performance while optimizing semiconductor manufacturing.

IDMs have specialized in producing next-generation semiconductor devices with the help of precise and capable EUV lithography technology. Major IDMs in the EUV lithography ecosystem include Intel Corporation and SAMSUNG. They supply all the necessary components like optics, light sources, masks, and metrology tools. IDMs and EUV lithography technology suppliers collaborate with each other to drive the EUV lithography industry. In April 2022, Intel Corporation collaborated with ASML to set up Ireland's first EUV lithography system, which enables the production of advanced microchips. The technology employs 13.5 nm EUV light and ultra-smooth multilayer mirrors.

In June 2022, SAMSUNG agreed with ASML to purchase next-generation EUV lithography gear and establish high-NA (numerical aperture) EUV systems. SAMSUNG planned to begin using high-NA EUV lithography in its production by 2024.

Asia Pacific Accounted for Largest Share Of Extreme Ultraviolet (EUV) Lithography Market in 2023

The Asia Pacific region offers significant prospects for the EUV lithography market as it is a major center of sophisticated semiconductor manufacturing. Key countries such as China, Japan, Taiwan, and South Korea have made significant investments in developing and introducing this technology in the market. There are cutting-edge semiconductor fabrication plants and research organizations operating in these countries to further enhance EUV lithography systems and their products. The mature semiconductor industry in the region supports the robust demand for EUV lithography solutions.

Asia Pacific is a major market for consumer electronics, especially for smartphones and tablets, among others. The increasing demand for smaller, faster, energy-efficient semiconductors has driven the adoption of advanced lithography technologies, particularly EUV, to facilitate the production of high-density, high-performance chips.

The region is also an important manufacturing hub for semiconductor equipment. Some of the key players in Japan and Taiwan are TOPPAN Inc., NTT Advanced Technology Corporation, ADVANTEST CORPORATION, Ushio Inc., AGC Inc., Lasertec Corporation, and NuFlare Technology, which provide lithography equipment. Other leading foundries, such as Taiwan Semiconductor Manufacturing Company Limited (TSMC) and Samsung Foundry, are also located in this region.

LARGEST MARKET SHARE IN 2025-2030
CHINA FASTER-GROWING MARKET IN REGION
Extreme Ultraviolet (EUV) Lithography Market
 Size and Share

Recent Developments of Extreme Ultraviolet (EUV) Lithography Market

  • In June 2024, ASML and Imec established a joint high-NA EUV Lithography Lab, providing an early development platform for the advanced semiconductor ecosystem. This collaboration represents a significant step in advancing high-NA-EUV lithography toward readiness for large-scale manufacturing adoption.
  • In January 2024, Carl Zeiss AG (Germany) developed high-NA-EUV lithography for advanced microchip production. Carl Zeiss AG developed and manufactured the optical system integral to this technology, which was delivered by its strategic partner, ASML. Series production of microchips using High-NA-EUV lithography is expected to begin in 2025.

Key Market Players

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Scope of the Report

Report Attribute Details
Market size available for years 2020–2029
Base year considered 2023
Forecast period 2024–2029
Forecast units Value (USD Million/Billion), Volume (Million Units)
Segments Covered By Component, End User and Region
Regions covered Americas, Europe, and Asia Pacific

Key Questions Addressed by the Report

What are the estimated and projected sizes of the global extreme ultraviolet (EUV) lithography market in 2024 and 2029, respectively? What is the projected CAGR of the market during the forecast period?
The extreme ultraviolet (EUV) lithography market is projected to grow from USD 12.18 billion in 2024 to USD 22.69 billion at a CAGR of 13.2%.
Who are the winners in the global extreme ultraviolet (EUV) lithography market?
ASML (Netherlands), KLA Corporation (US), Carl Zeiss AG (Germany), TRUMPF (Germany), and TOPPAN Inc. (Japan) are the major players in the EUV lithography market.
Which region will likely capture the largest share in the extreme ultraviolet (EUV) lithography market between 2024 and 2029?
Asia Pacific is projected to account for the largest share of the extreme ultraviolet (EUV) lithography market from 2024 to 2029.
Which factors are driving the extreme ultraviolet (EUV) lithography market and are expected to create opportunities for market players in the future?
The adoption of EUV lithography for advanced semiconductor nodes is a major factor driving the extreme ultraviolet (EUV) lithography market growth. Additionally, the commercialization of advanced displays for enhanced visual experiences acts as an opportunity for market players during the forecast period.
What are the major strategies players have adopted in the extreme ultraviolet (EUV) lithography market in recent years?
Key players have adopted product development and collaboration to strengthen their position in the extreme ultraviolet (EUV) lithography market.

 

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Table of Contents

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TITLE
PAGE NO
INTRODUCTION
16
RESEARCH METHODOLOGY
20
EXECUTIVE SUMMARY
33
PREMIUM INSIGHTS
36
MARKET OVERVIEW
38
  • 5.1 INTRODUCTION
  • 5.2 MARKET DYNAMICS
    DRIVERS
    - Adoption of EUV lithography for advanced semiconductor nodes
    - Rising demand for high-performance computing
    - Increasing complexity of integrated circuits
    - Advancements in consumer electronics
    RESTRAINTS
    - Need for significant upfront capital investment
    - Requirement for advanced infrastructure and skilled workforce
    OPPORTUNITIES
    - Increasing investments in advanced EUV lithography and semiconductor devices
    - Expanding deployment of EUV lithography in emerging applications
    - Advancement in memory module and chip development for next-generation devices
    - Commercialization of advanced displays for enhanced visual experiences
    - Application of advanced patterning technologies in photonics and optics production
    CHALLENGES
    - Competition from alternative lithography techniques
    - Difficulty in sustaining high source power and productivity
    - Detecting and addressing mask defects and yield challenges
  • 5.3 VALUE CHAIN ANALYSIS
    R&D ENGINEERS
    COMPONENT MANUFACTURERS
    SYSTEM INTEGRATORS
    MARKETING & SALES SERVICES PROVIDERS
    END USERS
  • 5.4 TRENDS/DISRUPTIONS IMPACTING CUSTOMER BUSINESS
  • 5.5 ECOSYSTEM ANALYSIS
  • 5.6 TECHNOLOGY ANALYSIS
    KEY TECHNOLOGIES
    - Light source
    - EUV masks
    COMPLEMENTARY TECHNOLOGIES
    - Mask pellicles
    - Plasma generation
    ADJACENT TECHNOLOGIES
    - Extreme ultraviolet reflectometry (EUVR)
    - Atomic layer deposition (ALD)
  • 5.7 INVESTMENT AND FUNDING SCENARIO
  • 5.8 PRICING ANALYSIS
    AVERAGE SELLING PRICE OF EUV LITHOGRAPHY SYSTEM
    AVERAGE SELLING PRICE TREND, BY REGION, 2020−2023
  • 5.9 CASE STUDY ANALYSIS
    INTEL SECURES EXCLUSIVE HIGH-NA EUV MACHINES
    LAM COLLABORATED WITH ASML TO DEVELOP DRY RESIST TECHNOLOGY THAT ADVANCES EUV LITHOGRAPHY
    TSMC ACQUIRED EUV SYSTEMS TO BOOST PRODUCTION CAPACITY
  • 5.10 PATENT ANALYSIS
  • 5.11 TRADE ANALYSIS
    IMPORT SCENARIO (HS CODE 8442)
    EXPORT SCENARIO (HS CODE 8442)
  • 5.12 PORTER'S FIVE FORCES ANALYSIS
    INTENSITY OF COMPETITIVE RIVALRY
    THREAT OF NEW ENTRANTS
    THREAT OF SUBSTITUTES
    BARGAINING POWER OF BUYERS
    BARGAINING POWER OF SUPPLIERS
  • 5.13 KEY STAKEHOLDERS AND BUYING CRITERIA
    KEY STAKEHOLDERS IN BUYING PROCESS
    BUYING CRITERIA
  • 5.14 TARIFF AND REGULATORY LANDSCAPE
    TARIFF ANALYSIS
    REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
    REGULATIONS
  • 5.15 KEY CONFERENCES AND EVENTS, 2024–2025
  • 5.16 IMPACT OF GEN AI/AI ON EUV LITHOGRAPHY MARKET
    INTRODUCTION
EUV LITHOGRAPHY MARKET, BY COMPONENT
71
  • 6.1 INTRODUCTION
  • 6.2 LIGHT SOURCES
    GROWING ADOPTION OF LPP EUV LIGHT SOURCES IN COMMERCIAL SYSTEMS TO PROPEL MARKET
  • 6.3 OPTICS
    HIGH PRECISION AND ACCURACY OF EUV OPTICS TO DRIVE ADOPTION
  • 6.4 MASKS
    GROWING EMPHASIS ON DEVELOPING NEXT-GENERATION SEMICONDUCTOR DEVICES TO PROPEL MARKET
  • 6.5 OTHERS
EUV LITHOGRAPHY MARKET, BY END USER
76
  • 7.1 INTRODUCTION
  • 7.2 INTEGRATED DEVICE MANUFACTURERS
    EMPHASIS ON DEVELOPING ADVANCED, ENERGY-EFFICIENT MICROCHIPS AND ICS TO DRIVE GROWTH
  • 7.3 FOUNDRIES
    INNOVATIONS IN SEMICONDUCTOR NODES TO ACCELERATE ADOPTION OF EUV LITHOGRAPHY BY FOUNDRIES
EUV LITHOGRAPHY MARKET, BY REGION
83
  • 8.1 INTRODUCTION
  • 8.2 AMERICAS
    PRESENCE OF STRONG SEMICONDUCTOR ECOSYSTEM TO PROPEL MARKET GROWTH
    MACROECONOMIC OUTLOOK FOR AMERICAS
  • 8.3 EUROPE
    STRATEGIC INVESTMENTS IN R&D BY GERMANY, NETHERLANDS, AND FRANCE TO STRENGTHEN MARKET GROWTH
    MACROECONOMIC OUTLOOK FOR EUROPE
  • 8.4 ASIA PACIFIC
    MACROECONOMIC OUTLOOK FOR ASIA PACIFIC
    CHINA
    - Advanced semiconductor production capabilities fueling market growth
    JAPAN
    - Strong semiconductor ecosystem driving market growth
    SOUTH KOREA
    - Advancement in EUV lithography fueling semiconductor innovation
    TAIWAN
    - Significant investments in eco-friendly EUV system components to drive growth
    REST OF ASIA PACIFIC
COMPETITIVE LANDSCAPE
96
  • 9.1 OVERVIEW
  • 9.2 KEY PLAYER STRATEGIES/RIGHT TO WIN, 2023–2024
  • 9.3 REVENUE ANALYSIS, 2021–2023
  • 9.4 MARKET SHARE ANALYSIS, 2023
  • 9.5 COMPANY VALUATION AND FINANCIAL METRICS
  • 9.6 COMPANY EVALUATION MATRIX: KEY PLAYERS, 2023
    STARS
    EMERGING LEADERS
    PERVASIVE PLAYERS
    PARTICIPANTS
    COMPANY FOOTPRINT: KEY PLAYERS, 2023
    - Company footprint
    - Region footprint
    - Component footprint
    - End user footprint
  • 9.7 COMPANY EVALUATION MATRIX: STARTUPS/SMES, 2023
    PROGRESSIVE COMPANIES
    RESPONSIVE COMPANIES
    DYNAMIC COMPANIES
    STARTING BLOCKS
    COMPETITIVE BENCHMARKING: STARTUPS/SMES, 2023
    - Detailed list of startups/SMEs
    - Competitive benchmarking of startups/SMEs
  • 9.8 COMPETITIVE SCENARIO
    PRODUCT LAUNCHES
    DEALS
    COMPANY PROFILES
  • 9.1 INTRODUCTION
  • 9.2 KEY PLAYERS
    ASML
    - Business overview
    - Products/Solutions/Services offered
    - Recent developments
    - MnM view
  • 9.3 KEY COMPONENT MANUFACTURERS
    CARL ZEISS AG
    - Carl Zeiss AG: Business overview
    - Products/Solutions/Services offered
    - Recent developments
    - MnM view
    NTT ADVANCED TECHNOLOGY CORPORATION
    - Business overview
    - Products/Solutions/Services offered
    - MnM view
    KLA CORPORATION
    - Business overview
    - Products/Solutions/Services offered
    - MnM view
    ADVANTEST CORPORATION
    - Business overview
    - Products/Solutions/Services offered
    - MnM view
    USHIO INC.
    - Business overview
    - Products/Solutions/Services offered
    SUSS MICROTEC SE
    - Business overview
    - Products/Solutions/Services offered
    AGC INC.
    - Business overview
    - Products/Solutions/Services offered
    LASERTEC CORPORATION
    - Business overview
    - Products/Solutions/Services offered
    TOPPAN INC.
    - Business overview
    - Products/Solutions/Services offered
  • 9.4 OTHER PLAYERS
    ENERGETIQ TECHNOLOGY, INC.
    NUFLARE TECHNOLOGY INC.
    PHOTRONICS, INC.
    HOYA CORPORATION
    TRUMPF
    RIGAKU HOLDINGS CORPORATION
    EDMUND OPTICS INC.
    IMAGINE OPTIC
    APPLIED MATERIALS, INC.
    PARK SYSTEMS
    EUV TECH
    MLOPTIC CROP.
    MKS INSTRUMENTS
    BROOKS AUTOMATION
    PFEIFFER VACUUM GMBH
APPENDIX
157
  • 10.1 INSIGHTS FROM INDUSTRY EXPERTS
  • 10.2 DISCUSSION GUIDE
  • 10.3 KNOWLEDGESTORE: MARKETSANDMARKETS’ SUBSCRIPTION PORTAL
  • 10.4 CUSTOMIZATION OPTIONS
  • 10.5 RELATED REPORTS
  • 10.6 AUTHOR DETAILS
LIST OF TABLES
 
  • TABLE 1 EUV LITHOGRAPHY MARKET: RISK FACTOR ANALYSIS
  • TABLE 2 EUV LITHOGRAPHY MARKET: ROLE OF COMPANIES IN ECOSYSTEM
  • TABLE 3 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM, 2019–2023 (USD)
  • TABLE 4 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM, BY REGION, 2020–2023 (USD)
  • TABLE 5 LIST OF MAJOR PATENTS, 2023–2024
  • TABLE 6 IMPORT DATA FOR HS CODE 8442-COMPLIANT PRODUCTS, BY COUNTRY, 2019–2023 (USD MILLION)
  • TABLE 7 EXPORT DATA FOR HS CODE 8442-COMPLIANT PRODUCTS, BY COUNTRY, 2019–2023 (USD MILLION)
  • TABLE 8 PORTER'S FIVE FORCES ANALYSIS: EUV LITHOGRAPHY MARKET
  • TABLE 9 INFLUENCE OF STAKEHOLDERS ON BUYING PROCESS FOR END USER (%)
  • TABLE 10 KEY BUYING CRITERIA FOR END USERS
  • TABLE 11 MFN TARIFF FOR HS CODE 8442-COMPLIANT PRODUCTS EXPORTED BY GERMANY, 2023
  • TABLE 12 AMERICAS: REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
  • TABLE 13 EUROPE: REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
  • TABLE 14 ASIA PACIFIC: REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
  • TABLE 15 EUV LITHOGRAPHY: REGULATIONS
  • TABLE 16 KEY CONFERENCES AND EVENTS, 2024–2025
  • TABLE 17 EUV LITHOGRAPHY MARKET, BY COMPONENT, 2020–2023 (USD MILLION)
  • TABLE 18 EUV LITHOGRAPHY MARKET, BY COMPONENT, 2024–2029 (USD MILLION)
  • TABLE 19 EUV LITHOGRAPHY MARKET, BY END USER, 2020–2023 (USD MILLION)
  • TABLE 20 EUV LITHOGRAPHY MARKET, BY END USER, 2024–2029 (USD MILLION)
  • TABLE 21 EUV LITHOGRAPHY MARKET, 2020–2023 (UNITS)
  • TABLE 22 EUV LITHOGRAPHY MARKET, 2024–2029 (UNITS)
  • TABLE 23 INTEGRATED DEVICE MANUFACTURERS: EUV LITHOGRAPHY MARKET, BY REGION, 2020–2023 (USD MILLION)
  • TABLE 24 INTEGRATED DEVICE MANUFACTURERS: EUV LITHOGRAPHY MARKET, BY REGION, 2024–2029 (USD MILLION)
  • TABLE 25 INTEGRATED DEVICE MANUFACTURERS: EUV LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2020–2023 (USD MILLION)
  • TABLE 26 INTEGRATED DEVICE MANUFACTURERS: EUV LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2024–2029 (USD MILLION)
  • TABLE 27 FOUNDRIES: EUV LITHOGRAPHY MARKET, BY REGION, 2020–2023 (USD MILLION)
  • TABLE 28 FOUNDRIES: EUV LITHOGRAPHY MARKET, BY REGION, 2024–2029 (USD MILLION)
  • TABLE 29 FOUNDRIES: EUV LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2020–2023 (USD MILLION)
  • TABLE 30 FOUNDRIES: EUV LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2024–2029 (USD MILLION)
  • TABLE 31 EUV LITHOGRAPHY MARKET, BY REGION, 2020–2023 (USD MILLION)
  • TABLE 32 EUV LITHOGRAPHY MARKET, BY REGION, 2024–2029 (USD MILLION)
  • TABLE 33 AMERICAS: EUV LITHOGRAPHY MARKET, BY END USER, 2020–2023 (USD MILLION)
  • TABLE 34 AMERICAS: EUV LITHOGRAPHY MARKET, BY END USER, 2024–2029 (USD MILLION)
  • TABLE 35 EUROPE: EUV LITHOGRAPHY MARKET, BY END USER, 2020–2023 (USD MILLION)
  • TABLE 36 EUROPE: EUV LITHOGRAPHY MARKET, BY END USER, 2024–2029 (USD MILLION)
  • TABLE 37 ASIA PACIFIC: EUV LITHOGRAPHY MARKET, BY COUNTRY, 2020–2023 (USD MILLION)
  • TABLE 38 ASIA PACIFIC: EUV LITHOGRAPHY MARKET, BY COUNTRY, 2024–2029 (USD MILLION)
  • TABLE 39 ASIA PACIFIC: EUV LITHOGRAPHY MARKET, BY END USER, 2020–2023 (USD MILLION)
  • TABLE 40 ASIA PACIFIC: EUV LITHOGRAPHY MARKET, BY END USER, 2024–2029 (USD MILLION)
  • TABLE 41 CHINA: EUV LITHOGRAPHY MARKET, BY END USER, 2020–2023 (USD MILLION)
  • TABLE 42 CHINA: EUV LITHOGRAPHY MARKET, BY END USER, 2024–2029 (USD MILLION)
  • TABLE 43 JAPAN: EUV LITHOGRAPHY MARKET, BY END USER, 2020–2023 (USD MILLION)
  • TABLE 44 JAPAN: EUV LITHOGRAPHY MARKET, BY END USER, 2024–2029 (USD MILLION)
  • TABLE 45 SOUTH KOREA: EUV LITHOGRAPHY MARKET, BY END USER, 2020–2023 (USD MILLION)
  • TABLE 46 SOUTH KOREA: EUV LITHOGRAPHY MARKET, BY END USER, 2024–2029 (USD MILLION)
  • TABLE 47 TAIWAN: EUV LITHOGRAPHY MARKET, BY END USER, 2020–2023 (USD MILLION)
  • TABLE 48 TAIWAN: EUV LITHOGRAPHY MARKET, BY END USER, 2024–2029 (USD MILLION)
  • TABLE 49 REST OF ASIA PACIFIC: EUV LITHOGRAPHY MARKET, BY END USER, 2020–2023 (USD MILLION)
  • TABLE 50 REST OF ASIA PACIFIC: EUV LITHOGRAPHY MARKET, BY END USER, 2024–2029 (USD MILLION)
  • TABLE 51 EUV LITHOGRAPHY MARKET: KEY PLAYER STRATEGIES/RIGHT TO WIN, 2023–2024
  • TABLE 52 EUV LITHOGRAPHY MARKET: DEGREE OF COMPETITION
  • TABLE 53 EUV LITHOGRAPHY MARKET: REGION FOOTPRINT
  • TABLE 54 EUV LITHOGRAPHY MARKET: COMPONENT FOOTPRINT
  • TABLE 55 EUV LITHOGRAPHY MARKET: END USER FOOTPRINT
  • TABLE 56 EUV LITHOGRAPHY MARKET: DETAILED LIST OF KEY STARTUPS/SMES
  • TABLE 57 EUV LITHOGRAPHY MARKET: COMPETITIVE BENCHMARKING OF KEY STARTUPS/SMES
  • TABLE 58 EUV LITHOGRAPHY MARKET: PRODUCT LAUNCHES, JULY 2023−NOVEMBER 2024
  • TABLE 59 EUV LITHOGRAPHY MARKET: DEALS, JULY 2023–NOVEMBER 2024
  • TABLE 60 ASML: COMPANY OVERVIEW
  • TABLE 61 ASML: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 62 ASML: DEALS
  • TABLE 63 CARL ZEISS AG: COMPANY OVERVIEW
  • TABLE 64 CARL ZEISS AG: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 65 CARL ZEISS AG: PRODUCT LAUNCHES
  • TABLE 66 NTT ADVANCED TECHNOLOGY CORPORATION: COMPANY OVERVIEW
  • TABLE 67 NTT ADVANCED TECHNOLOGY CORPORATION: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 68 KLA CORPORATION: COMPANY OVERVIEW
  • TABLE 69 KLA CORPORATION: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 70 ADVANTEST CORPORATION: COMPANY OVERVIEW
  • TABLE 71 ADVANTEST CORPORATION: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 72 USHIO INC.: COMPANY OVERVIEW
  • TABLE 73 USHIO INC.: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 74 SUSS MICROTEC SE: COMPANY OVERVIEW
  • TABLE 75 SUSS MICROTEC SE: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 76 AGC INC.: COMPANY OVERVIEW
  • TABLE 77 AGC INC.: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 78 LASERTEC CORPORATION: COMPANY OVERVIEW
  • TABLE 79 LASERTEC CORPORATION: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 80 TOPPAN INC.: COMPANY OVERVIEW
  • TABLE 81 TOPPAN INC.: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 82 ENERGETIQ TECHNOLOGY, INC.: COMPANY OVERVIEW
  • TABLE 83 NUFLARE TECHNOLOGY INC.: COMPANY OVERVIEW
  • TABLE 84 PHOTRONICS, INC.: COMPANY OVERVIEW
  • TABLE 85 HOYA CORPORATION: COMPANY OVERVIEW
  • TABLE 86 TRUMPF: COMPANY OVERVIEW
  • TABLE 87 RIGAKU HOLDINGS CORPORATION: COMPANY OVERVIEW
  • TABLE 88 EDMUND OPTICS INC.: COMPANY OVERVIEW
  • TABLE 89 IMAGINE OPTIC: COMPANY OVERVIEW
  • TABLE 90 APPLIED MATERIALS, INC.: COMPANY OVERVIEW
  • TABLE 91 PARK SYSTEMS: COMPANY OVERVIEW
  • TABLE 92 EUV TECH: COMPANY OVERVIEW
  • TABLE 93 MLOPTIC CORP.: COMPANY OVERVIEW
  • TABLE 94 MKS INSTRUMENTS: COMPANY OVERVIEW
  • TABLE 95 BROOKS AUTOMATION: COMPANY OVERVIEW
  • TABLE 96 PFEIFFER VACUUM GMBH: COMPANY OVERVIEW
LIST OG FIGURES
 
  • FIGURE 1 EUV LITHOGRAPHY MARKET SEGMENTATION AND REGIONAL SCOPE
  • FIGURE 2 EUV LITHOGRAPHY MARKET: RESEARCH DESIGN
  • FIGURE 3 MARKET SIZE ESTIMATION METHODOLOGY—APPROACH 1 (SUPPLY SIDE): REVENUE GENERATED BY KEY COMPONENT SUPPLIERS
  • FIGURE 4 MARKET SIZE ESTIMATION METHODOLOGY—APPROACH 2 (SUPPLY SIDE): ILLUSTRATION OF REVENUE ESTIMATION OF KEY PLAYERS
  • FIGURE 5 MARKET SIZE ESTIMATION METHODOLOGY—APPROACH 3 (DEMAND SIDE): EUV LITHOGRAPHY MARKET BASED ON REGION
  • FIGURE 6 MARKET SIZE ESTIMATION METHODOLOGY: BOTTOM-UP APPROACH
  • FIGURE 7 MARKET SIZE ESTIMATION METHODOLOGY: TOP-DOWN APPROACH
  • FIGURE 8 EUV LITHOGRAPHY MARKET: DATA TRIANGULATION
  • FIGURE 9 EUV LITHOGRAPHY MARKET, 2020–2029
  • FIGURE 10 FOUNDRIES TO ACCOUNT FOR LARGER MARKET SHARE DURING FORECAST PERIOD
  • FIGURE 11 ASIA PACIFIC TO RECORD HIGHEST CAGR IN EUV LITHOGRAPHY MARKET FROM 2024 TO 2029
  • FIGURE 12 STRONG PRESENCE OF SEMICONDUCTOR CHIP MANUFACTURING COMPANIES IN ASIA PACIFIC DRIVING MARKET
  • FIGURE 13 FOUNDRIES TO ACCOUNT FOR LARGER SHARE OF EUV LITHOGRAPHY MARKET
  • FIGURE 14 LIGHT SOURCES SEGMENT TO DOMINATE EUV LITHOGRAPHY MARKET DURING FORECAST PERIOD
  • FIGURE 15 ASIA PACIFIC TO DOMINATE EUV LITHOGRAPHY MARKET DURING FORECAST PERIOD
  • FIGURE 16 DRIVERS, RESTRAINTS, OPPORTUNITIES, AND CHALLENGES
  • FIGURE 17 IMPACT ANALYSIS: DRIVERS
  • FIGURE 18 IMPACT ANALYSIS: RESTRAINTS
  • FIGURE 19 IMPACT ANALYSIS: OPPORTUNITIES
  • FIGURE 20 IMPACT ANALYSIS: CHALLENGES
  • FIGURE 21 EUV LITHOGRAPHY VALUE CHAIN ANALYSIS
  • FIGURE 22 TRENDS/DISRUPTIONS IMPACTING CUSTOMER BUSINESS
  • FIGURE 23 EUV LITHOGRAPHY MARKET: ECOSYSTEM ANALYSIS
  • FIGURE 24 INVESTMENT AND FUNDING SCENARIO, 2020−2024
  • FIGURE 25 AVERAGE SELLING PRICE OF EUV LITHOGRAPHY SYSTEM, BY KEY PLAYER, 2023
  • FIGURE 26 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM, BY REGION, 2020−2023
  • FIGURE 27 PATENTS APPLIED AND GRANTED, 2014–2023
  • FIGURE 28 IMPORT DATA FOR HS CODE 8442-COMPLIANT PRODUCTS, BY COUNTRY, 2019–2023
  • FIGURE 29 EXPORT DATA FOR HS CODE 8442-COMPLIANT PRODUCTS, BY COUNTRY, 2019–2023 (USD MILLION)
  • FIGURE 30 EUV LITHOGRAPHY MARKET: PORTER'S FIVE FORCES ANALYSIS
  • FIGURE 31 INFLUENCE OF STAKEHOLDERS ON BUYING PROCESS FOR END USER
  • FIGURE 32 KEY BUYING CRITERIA FOR END USERS
  • FIGURE 33 IMPACT OF GEN AI/AI ON EUV LITHOGRAPHY MARKET
  • FIGURE 34 LIGHT SOURCES TO REGISTER HIGHEST CAGR DURING FORECAST PERIOD
  • FIGURE 35 FOUNDRIES TO ACCOUNT FOR LARGER MARKET SHARE DURING FORECAST PERIOD
  • FIGURE 36 ASIA PACIFIC TO DOMINATE EUV LITHOGRAPHY MARKET
  • FIGURE 37 SOUTH KOREA TO EXHIBIT HIGHEST CAGR IN EUV LITHOGRAPHY MARKET DURING FORECAST PERIOD
  • FIGURE 38 AMERICAS: EUV LITHOGRAPHY MARKET SNAPSHOT
  • FIGURE 39 EUROPE: EUV LITHOGRAPHY MARKET SNAPSHOT
  • FIGURE 40 ASIA PACIFIC: EUV LITHOGRAPHY MARKET SNAPSHOT
  • FIGURE 41 EUV LITHOGRAPHY MARKET: REVENUE ANALYSIS OF KEY PLAYERS, 2021–2023
  • FIGURE 42 EUV LITHOGRAPHY MARKET SHARE ANALYSIS, 2023
  • FIGURE 43 COMPANY VALUATION, 2024
  • FIGURE 44 FINANCIAL METRICS, 2023
  • FIGURE 45 PRODUCT/BRAND COMPARISON
  • FIGURE 46 EUV LITHOGRAPHY MARKET: COMPANY EVALUATION MATRIX (KEY PLAYERS), 2023
  • FIGURE 47 EUV LITHOGRAPHY MARKET: COMPANY FOOTPRINT
  • FIGURE 48 EUV LITHOGRAPHY MARKET: COMPANY EVALUATION MATRIX (STARTUPS/SMES), 2023
  • FIGURE 49 ASML: COMPANY SNAPSHOT
  • FIGURE 50 CARL ZEISS AG: COMPANY SNAPSHOT
  • FIGURE 51 NTT ADVANCED TECHNOLOGY CORPORATION: COMPANY SNAPSHOT
  • FIGURE 52 KLA CORPORATION: COMPANY SNAPSHOT
  • FIGURE 53 ADVANTEST CORPORATION: COMPANY SNAPSHOT
  • FIGURE 54 USHIO INC.: COMPANY SNAPSHOT
  • FIGURE 55 SUSS MICROTEC SE: COMPANY SNAPSHOT
  • FIGURE 56 AGC INC.: COMPANY SNAPSHOT
  • FIGURE 57 LASERTEC CORPORATION: COMPANY SNAPSHOT
  • FIGURE 58 TOPPAN INC.: COMPANY SNAPSHOT

The study involved significant activities in estimating the current market size for the EUV lithography market. Exhaustive secondary research was done to collect information on the EUV lithography industry. The next step was to validate these findings, assumptions, and sizing with industry experts across the value chain using primary research. Different approaches, such as top-down and bottom-up, were employed to estimate the total market size. After that, the market breakup and data triangulation procedures were used to estimate the market size of the segments and subsegments of the EUV lithography market.

Secondary Research

The market for the companies offering EUV lithography systems and components is arrived at by secondary data available through paid and unpaid sources, analyzing the product portfolios of the major companies in the ecosystem, and rating the companies by their performance and quality. Various sources were referred to in the secondary research process to identify and collect information for this study. The secondary sources include annual reports, press releases, investor presentations of companies, white papers, journals, certified publications, and articles from recognized authors, directories, and databases. In the secondary research process, various secondary sources were referred to determine and collect information related to the scope of the study. Secondary sources included annual reports, press releases, investor presentations of EUV lithography equipment manufacturers, certified publications, and whitepapers. The secondary research was used to obtain critical information on the industry's value chain, the total pool of key players, market classification, and segmentation from the market and technology-oriented perspectives.

Primary Research

In the primary research process, various supply and demand sources were interviewed to obtain qualitative and quantitative information for this report. The primary sources from the supply side included industry experts, such as Chief Executive Officers (CEOS), Vice Presidents (VPs), marketing directors, technology and innovation directors, and related key executives from various key companies and organizations operating in the EUV lithography market.

After the complete market engineering (calculations for market statistics, market breakdown, market size estimations, market forecasting, and data triangulation), extensive primary research was conducted to gather information and verify and validate the critical numbers arrived at. Primary research was also conducted to identify the segmentation types, industry trends, competitive landscape of EUV lithography solutions offered by various market players, and key market dynamics, such as drivers, restraints, opportunities, challenges, industry trends, and key player strategies.

In the complete market engineering process, the top-down and bottom-up approaches were extensively used, along with several data triangulation methods, to perform the market estimation and market forecasting for the overall market segments and subsegments listed in this report.

Extensive qualitative and quantitative analysis was performed on the complete market engineering process to list the key information/insights throughout the report.

 

Extreme Ultraviolet (EUV) Lithography Market
 Size, and Share

Note: “Others” includes sales, marketing, and product managers

To know about the assumptions considered for the study, download the pdf brochure

Market Size Estimation

The market engineering process extensively employed the top-down and bottom-up approaches. Various data triangulation methods were utilized to forecast and estimate the market segments and subsegments covered in the report. Multiple qualitative and quantitative analyses were conducted during the market engineering to extract key insights throughout the report.

Secondary research helped identify key players in the EUV lithography market. Their revenues were determined through a combination of primary and secondary research, analyzed both geographically and by market segment, using financial statements and annual reports. Insights were further enriched through interviews with CEOs, VPs, directors, and marketing executives.

Market shares were estimated using this combined research approach. The data was then consolidated, supplemented with detailed inputs and analysis from MarketsandMarkets, and presented in the report.

Extreme Ultraviolet (EUV) Lithography Market : Top-Down and Bottom-Up Approach

Extreme Ultraviolet (EUV) Lithography Market
 Top Down and Bottom Up Approach

Data Triangulation

The market was split into three segments and subsegments after arriving at the overall market size using the market size estimation processes explained above. The data triangulation and market breakup procedures were employed, wherever applicable, to complete the overall market engineering process and arrive at the exact statistics of each market segment and subsegment. The data was triangulated by studying various factors and trends from both the demand and supply sides.

Market Definition

EUV Lithography is a leading semiconductor manufacturing process, allowing to build smaller and more intricate computer chips. By using an extreme ultraviolet light of ~13.5 nanometers, facilitates making etch features on a silicon wafer, a technology that helps in minimizing the size of transistors, and allows the miniaturization of transistors and the development of intricate and detailed integrated circuits. The modern systems of EUV lithography achieve resolutions as small as 5 nanometers and aid in the production of high-performance, energy-efficient processors.

It is divided mainly into key steps, such as source generation, light collection, and conditioning. Mask fabrication, projection, imaging, photoresist application, exposure, development, etching, deposition, and iterative processing are also considered in the processing. Some of the principal components of an EUV system are found to be the light sources, optics, masks, metrology tools, sensors, and subassemblies.

Key Stakeholders

  • Semiconductor Manufacturers
  • EUV Lithography Component Suppliers
  • Raw Material Providers
  • Metrology and Inspection Equipment Providers
  • Foundries and IDMs (Integrated Device Manufacturers)
  • Research Institutions and Consortia
  • Government Agencies and Funding Bodies

Report Objectives

The following are the primary objectives of the study.

  • To define, describe, and forecast the size of the extreme ultraviolet (EUV) lithography market by component, end user, and region in terms of value.
  • To describe and forecast the market size for various segments with regard to three main regions: Asia Pacific, the Americas, and Europe
  • To forecast the shipments of EUV lithography systems from 2024 to 2029
  • To provide detailed information regarding the key factors such as drivers, restraints, opportunities, and challenges influencing the growth of the market
  • To provide macroeconomic outlooks with respect to main regions namely the Americas, Europe, and Asia Pacific
  • To provide a detailed overview of the extreme ultraviolet (EUV) lithography market value chain, industry trends, technology trends, use cases, regulatory landscape, and Porter’s five forces.
  • To strategically analyze micromarkets with respect to individual growth trends, prospects, and contributions to the total market
  • To provide ecosystem analysis, trends/disruptions impacting customer business, technology analysis, pricing analysis, key stakeholders & buying criteria, case study analysis, trade analysis, patent analysis, key conferences & events, Gen AI/ AI impact, and regulations related to the extreme ultraviolet (EUV) lithography market
  • To analyze the opportunities in the market for stakeholders by identifying high-growth segments and detailing the competitive landscape for market players.
  • To strategically profile key players and comprehensively analyze their market rankings, core competencies, company valuation and financial metrics, and product/brand comparison, along with detailing the competitive landscape for the market leaders
  • To analyze the competitive developments, such as product launch and collaboration carried out by market players
  • To benchmark players within the market using the proprietary competitive leadership mapping framework, which analyzes market players on various parameters within the broad categories of business strategy excellence and strength of product portfolio

Available Customizations

With the given market data, MarketsandMarkets offers customizations according to the specific requirements of companies. The following customization options are available for the report:

  • Country-wise information for Asia Pacific
  • Detailed analysis and profiling of additional market players (up to five)

Previous Versions of this Report

Extreme Ultraviolet (EUV) Lithography Market by Equipment (Light Sources, Masks and Optics), End User (Integrated Device Manufacturer (IDM) and Foundry) and Region (Americas, Europe and Asia Pacific) - Global Forecast to 2028

Report Code SE 6398
Published in Jul, 2023, By MarketsandMarkets™

Extreme Ultraviolet (EUV) Lithography Market by Equipment (Light Sources, Masks and Optics), End User (Integrated Device Manufacturer (IDM) and Foundry) and Region (Americas, Europe and Asia Pacific) - Global Forecast to 2028

Report Code SE 6398
Published in Jun, 2018, By MarketsandMarkets™
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