Extreme Ultraviolet (EUV) Lithography Companies

The EUV lithography market is expected to reach USD 22.69 billion by 2029 from USD 12.18 billion in 2024, at a CAGR of 13.2% during the 2024-2029 period.

The growing demand for advanced semiconductor devices with smaller nodes and higher performance, driven by applications in AI, 5G, IoT, and high-performance computing is driving the EUV lithography market. EUV lithography provides the chip architecture as intricately small, making it a necessity for manufacturing cutting-edge technologies. Moreover, technological innovation is associated with the increased requirement for energy-efficient and high-speed electronic devices further augmenting the market. Investment in R&D and government support for semiconductor production are also factors associated with the growth of this EUV lithography market.

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Major Extreme Ultraviolet (EUV) Lithography companies include:

• ASML (Netherlands)
• Carl Zeiss AG (Germany)
• NTT Advanced Technology Corporation (Japan)
• KLA Corporation (US)
• ADVANTEST CORPORATION (Japan)
• Ushio Inc. (Japan)
• SUSS MicroTec SE (Germany)
• AGC Inc. (Japan)
• Lasertec Corporation (Japan)
• TOPPAN Inc. (Japan)
• Energetiq Technology, Inc. (Japan)
• NuFlare Technology Inc. (US)
• Photronics, Inc. (Japan)
• HOYA Corporation (Japan)
• TRUMPF (Germany)
• Rigaku Holdings Corporation (Japan)
• Edmund Optics Inc. (US)
• Imagine Optic (France)
• Applied Materials, Inc. (US)
• Park Systems (South Korea)
• EUV Tech (US)
• Mloptic Corp. (China)
• MKS Instruments (US)
• Brooks Automation (US)
• Pfeiffer Vacuum GmbH (Germany)

The major players in the EUV lithography market are ASML (Netherlands), Carl Zeiss AG (Germany), NTT Advanced Technology Corporation (Japan), KLA Corporation (US), ADVANTEST CORPORATION (Japan), Ushio Inc. (Japan), SUSS MicroTec SE (Germany), AGC Inc. (Japan), Lasertec Corporation (Japan), Energetiq Technology, Inc. (Japan), NuFlare Technology Inc. (US), Photronics, Inc. (Japan), HOYA Corporation (Japan), TRUMPF (Germany), Rigaku Holdings Corporation (Japan), Edmund Optics Inc. (US), Imagine Optic (France), Applied Materials, Inc. (US), Park Systems (South Koria), EUV Tech (US), Mloptic Crop. (China), MKS Instruments (US), Brooks Automation (US), and Pfeiffer Vacuum GmbH (Germany).

ASML

ASML is one of the world's leading Dutch companies and is recognized as one of the world's leading manufacturers of semiconductor equipment, specializing in advanced lithography systems critical to chip production. ASML designs and produces leading-edge lithography machines used by the world's leading semiconductor companies, including Intel Corporation, SAMSUNG and many others in fabrication plants (fabs) to produce microchips for devices such as smartphones and laptops.

The company is the only provider of extreme ultraviolet (EUV) lithography systems, which work on a 13.5 nm wavelength to print the smallest features on microchips with the highest density. ASML operates through 6 business segments including NXE, ArFi, ArF dry, KrF, metrology & inspection, and i-line. ASML offers EUV lithography through its NXE business segment.

KLA Corporation

KLA Corporation provides advanced process control and process-enabling solutions worldwide. The company designs and produces equipment and services related to the production of wafers, reticles, integrated circuits, packaging, and printed circuit boards.

KLA Corporation offers EUV-specific components and systems that accurately control photomask and wafer inspections in the EUV lithography market. Their solutions are utilized for improvement in yield and accuracy to EUV-based semiconductor manufacturing leading to next-generation lithography technologies.

KLA Corporation operates under three business segments: Semiconductor Process Control, PCB and Component Inspection, and Specialty Semiconductor Process. The Semiconductor Process Control segment is relevant to the market under study since it designs, manufactures, and supplies reticle metrology systems. The company operates globally in countries such as China, Taiwan, South Korea, North America, Japan, Europe, Israel, and other regions in Asia.

Carl Zeiss AG 

Carl Zeiss AG, headquartered in Oberkochen, Germany, is a global technology company that specializes in optics and optoelectronics. It operates in five key business segments: Semiconductor Manufacturing Technology, Industrial Quality & Research, Medical Technology, Consumer Markets, and others, operating in more than 50 countries. Carl Zeiss AG is among the key supplier of high-precision optical components in semiconductor manufacturing technology. Carl Zeiss AG offers EUV lithography optics with ultra-precise mirrors used to pattern silicon wafers, and projection optics systems to provide high-resolution photolithography to ASML. Carl Zeiss AG also offers illumination systems ensuring proper light distribution for an EUV process. Carl Zeiss AG is geographically presence in Americas, Europe, Asia Pacific, Middle East, and African countries.

TRUMPF

TRUMPF is a Germany based company operated through more than 70 subsidiaries and employing over 19,018 people worldwide. TRUMPF is a high tech company provides solutions for machine tool, laser technology, and power electronics. The company plays a critical role by providing high-power laser system which is important for the generation of EUV radiation. EUV lithography is an advanced technology used to manufacture microchips with extremely fine structures.
TRUMPF Laser Amplifier produces pulses of laser light, intending to hit tin droplets which turn the tin into plasma. EUV light is produced in the process at 13.5 nanometers, which then hits the semiconductor wafers for exposure. Therefore, this system can produce up to 50,000 laser pulses per second. With this technology, the process of semiconductor manufacturing also advances by allowing smaller, more powerful, and energy-efficient microchips.

TOPPAN Inc.

Toppan Inc. is a global provider of printing and electronics solutions based on its high-tech materials for the semiconductor industry. Toppan Inc. also plays a pivotal role in the supply of high-precision photomasks in the EUV lithography process used in the development of next-generation semiconductor devices. The company operates in three significant business segments: Information & Communication, Living & Industry, and Electronics. Under its Electronics segment, TOPPAN Inc. provides EUV lithography components. A subsidiary of TOPPAN Inc., Tekscend Photomask (previously called Toppan Photomasks renamed in November 2024) is involved in the development and distribution of photomasks, including EUV photomasks, which plays a key role in producing semiconductors as well as displays.

Related Reports:

Extreme Ultraviolet (EUV) Lithography Market by Component (Light Sources, Optics, Masks, EUV Metrology, EUV Sensors, EUV Subassembly) and End User (Integrated Device Manufacturers (IDMs), Foundries) - Global Forecast to 2029

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